Top imaged resists

Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer

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430325, 430311, 430313, 430323, 430331, 430296, 430299, 430942, 430966, 430967, 430272, 430190, 430193, 156643, 427 541, 427 531, 427 44, 427 35, 427 36, 427 38, G03C 300, G03C 500, B05D 306

Patent

active

048106011

ABSTRACT:
The present invention is concerned with methods of converting a single resist layer into a multilayered resist.
The upper portion of the single resist layer can be converted into a dry-etch resistant form. The conversion can be a blanket conversion of the upper portion of the resist layer or can be a patterned conversion of areas within the upper portion of the layer. A patternwise-converted resist can be oxygen plasma developed.
The upper portion of the single resist layer can be patternwise converted into a chemically different composition or structure having altered absorptivity toward radiation. The difference in radiation absorptivity within the patterned upper portion of the resist enables subsequent use of blanket irradiation of the resist surface to create differences in chemical solubility between areas having the altered absorptivity toward radiation and non-altered areas. The difference in chemical solubility enables wet development of the patterned resist.

REFERENCES:
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patent: 4430153 (1984-02-01), Gleason et al.
patent: 4433044 (1984-02-01), Meyer et al.
patent: 4552833 (1985-11-01), Ito et al.
patent: 4600686 (1986-07-01), Meyer et al.
patent: 4606932 (1986-08-01), Oprysko et al.
patent: 4613398 (1986-09-01), Chiong et al.
T. Venkatesan et al., "Plasma-developed ion-implanted resists with submicron resolution", Journal of Vaccuum Science and Technology; vol. 19, 1981, pp. 1379-1384.
Y. W. Yau et al, "Generation and applications of finely focused beams of low-energy electrons" pp. 1048-1052, Journal of Vaccuum Science and Technology, vol. 19, 1981, pp. 1048-1052.
Roland et al, SPIE, vol. 631, Advances in Resist Technology and Processing III (1986), pp. 34-40.
G. N. Taylor et al, "Gas-Phase-Functionalized Plasma-Developed Resists:Initial Concepts and Results for Electron Beam Exposure", pp. 1658-1664, Journal of Electrochemical Society: Solid State Science and Technology, Jul. 1984.

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