Method for making W/Ti sputtering targets and products in an ine

Powder metallurgy processes – Powder metallurgy processes with heating or sintering – Heat and pressure simultaneously to effect sintering

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419 54, 419 57, 75248, B22F 314, C22C 104, C22C 1400

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active

059937343

ABSTRACT:
The invention relates to the manufacture of sputtering targets of tungsten-titanium alloy using high purity tungsten and titanium hydride powders. The powders are blended and placed in a containment vessel holding a die. The die is heated to a temperature of about 700.degree. C. to about 1000.degree. C. in an argon atmosphere while under pressure. The combination of temperature and pressure is high enough to dehydrate the titanium hydride and to remove the gases. The die is then heated to a higher temperature, in the range of about 1250.degree. C. to 1350.degree. C. while the pressure is increased so as to compact and alloy the powders. The pressure and temperature are held constant until there is no further movement of the ram. The resulting compacted alloy material is then machined to provide a sputtering target with a density between 96% and 100% of theoretical and a gas content less than 850 p.p.m. In a further feature of the present invention, a tungsten-titanium hydride powder may be used as the raw material for manufacturing the target. The raw materials of the present invention may be obtained by recycling used titanium targets or used tungsten-titanium targets.

REFERENCES:
patent: 5863398 (1999-01-01), Kardokus et al.

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