Method for developing residual-moisture photographs

Details Method for developing residual-moisture photographs Method for developing residual-moisture photographs

1978-08-25

1981-02-10

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Thermographic process

Heat applied after imaging

430422, 430423, 430425, 430441, 73147, G03C 530, G01M 900

Patent

active

042502497

ABSTRACT:
For developing residual-moisture photographs according to the wet-film technique, a pre-treatment with a first solution of about 5% ethanolic NaOH is performed first at about 13.degree. C. After the alkali exchange, the exposed film passes through a bath at a bath temperature of 50.degree. C. with a hydroquinone-containing photographic developer. This "Two-bath wet developing method" takes place in daylight. The developed, fixed, rinsed and dried film can be evaluated directly.

REFERENCES:
patent: 1417791 (1922-05-01), Bagley
patent: 3694209 (1972-09-01), Schwienbacher
patent: 3774225 (1973-11-01), Kimmel et al.
patent: 3787874 (1974-01-01), Urban
patent: 3890835 (1975-06-01), Dotzer
Engineering News-Record, Nov. 12, 1936, p. 684, "Flow Turbulence Analyzed by Means of Photography".
Clerc; Photography: Theory and Practice, 2nd Ed. 1937, p. 250.

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