Magnetically enhanced sputtering device and method

Details Magnetically enhanced sputtering device and method Magnetically enhanced sputtering device and method

1979-04-24

1982-01-26

Gantz, Delbert E.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

043127312

ABSTRACT:
A method and apparatus for establishing the magnetic field in a magnetically enhanced sputtering device wherein a predetermined plasma path is formed adjacent a layer of target material to be sputtered wherein a first component of the magnetic field is substantially perpendicular to the plasma path and a second component thereof is substantially parallel to the path. Various embodiments are described for generating the foregoing magnetic field components.

REFERENCES:
patent: 3878085 (1975-04-01), Corbani
patent: 3956093 (1976-05-01), McLeod
patent: 4046660 (1977-09-01), Fraser
J. L. Vossen, W. Kern., editors, Thin Film Processes, Academic Press, New York, 1978, pp. 76-83.

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