Exposure apparatus and photo mask

Details Exposure apparatus and photo mask Exposure apparatus and photo mask

1995-06-07

1996-07-30

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430323, 430322, 359558, G03F 900

Patent

active

055410260

ABSTRACT:
In the lithographic operation for the manufacture of semiconductor devices, polarization of an exposure light is utilized as third information other than the amplitude and phase of the exposure light so as to obtain a high-resolution or high-contrast imaging performance. An exposure apparatus includes polarizing means arranged at the position of an incidence pupil of its projection optical system. Also, in a photo mask containing a pattern formed on a transparent substrate, a polarizing member is added to each of light transmitting portions in the pattern. With the diffracted beams from the photo mask contribution toward imaging, the directions of vibration of the electric vectors are arranged regularly to enhance interference performance and thereby to improve the contrast of an image. Also, the fundamental period of the pattern on the mask is substantially increased to improve the resolving power.

REFERENCES:
patent: 4806454 (1989-02-01), Yoshida et al.

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