Method and apparatus for designing photomasks

Details Method and apparatus for designing photomasks Method and apparatus for designing photomasks

1994-12-28

1996-07-30

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430311, 430315, G03F 900

Patent

active

055410251

ABSTRACT:
Method and apparatus for designing the photomask in the course of designing the Levenson-type phase shift mask, capable of automatically arranging the shifter, of not causing a contradictory spot in a circuit designing stage and of automatically forming a final layout achieving maximum integrity. The method includes the steps of: forming symbolic layout data in which a distance between adjacent clear areas is set to an arbitrary value; determining regions having a mutual phase difference 0.degree. or 180.degree. of light transmitting through adjacent patterns corresponding to the clear areas in the symbolic layout data; executing compaction of the symbolic layout in a manner that design rule S1 is adopted to the clear areas neighboring with the phase difference of 180.degree. and design rule S2 is adopted to the clear areas neighboring with the phase difference of 0.degree.; and forming mask layout data such that S1 is less than S2.

REFERENCES:
patent: 5358807 (1994-10-01), Okamoto

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