Coating processes – Measuring – testing – or indicating
Patent
1989-04-03
1991-05-14
Silverman, Stanley
Coating processes
Measuring, testing, or indicating
427 42, 427 531, 118620, 118641, 118 501, 118726, 118712, B05D 306, C23C 1400
Patent
active
050154923
ABSTRACT:
Vapor deposition of a thin film is accomplished by employing a pulsed laser to irradiate at least a region of a homogeneous stoichiometric complex material pellet with sufficient energy density to accomplish congruent evaporation of constituents of the material. The energy density is further at least sufficient to cause at least a predetermined portion, a central forward lobe, of the evaporant to have approximately the same stoichiometry as the irradiated material. A substrate is positioned to allow deposit thereon of that lobe portion of the evaporant as a thin film. Also shown are apparatus for masking out predetermined portions of the evaporant outside said lobe and passing at least a part of the lobe evaporant through a mask aperture, use of apparatus for causing relative movement of the substrate and the mask to achieve film deposition over a substrate area substantially larger than the area of the aperture, apparatus for charge level detection in the evaporant stream to detct lobe drift, and apparatus for tilting the pellet to compensate for drift of the forward lobe away from the mask aperture.
REFERENCES:
patent: 3645786 (1972-02-01), Tannenberger et al.
patent: 3655430 (1972-04-01), Greaves
patent: 4128121 (1978-12-01), Sigsbee
patent: 4222783 (1980-09-01), Atsumi et al.
patent: 4286545 (1981-09-01), Takagi et al.
patent: 4604429 (1986-08-01), Tanaka et al.
patent: 4619691 (1986-10-01), Araya et al.
patent: 4816293 (1989-03-01), Hiramoto et al.
Burton, et al. "Laser Deposition of YBa.sub.2 Cu.sub.3 O.sub.7-8 Thin Films", American Vac. Soc. Series 3, ed. Lucovsky; 11/6/87.
Bartholomew et al, "Low temp. Syn. of High-Tc Superconducting Thin Films by Laser Assisted Reactive Dep."; High-Temp. Supercond. II, 4/88.
Lynds et al, "Supercond. Thin Films of (RE)Ba.sub.2 Cu.sub.3 (Ag)O.sub.7- x Prep. by Pulsed Laser Abation", High-Temp. Supercond., Brodskey et al, ed.; 12/87.
Narayan et al, "Formation of Thin Supercond. Films by the Laser Processing Method", Appl. Phys. Lett, vol. 51, #22; Nov. 30, 1987.
D. Dijkkamp et al., "Preparation of Y--Ba--Cu oxide superconductor thin films using pulsed laser evaporation from high Tc bulk material," Aug. 24, 1987, 619-621, Appl. Phys. Lett 51(8).
T. Venkatesan, "Laser deposited high Tc superconducting thin films," Dec. 1987 3-41, Solid State Technology.
X. D. Wu et al., "A simple method to prepare high Tc superconducting thin films: pulsed laser deposition," 1988, 175-181, reprinted from Chemistry of Oxide Superconductors edited by C. N. R. Rao.
T. Venkatesan et al., "Observation of two distinct components during pulsed laser deposition of high Tc superconducting films," Apr. 4, 1988, app. Phys. Lett. 52(14).
C. C. Chang et al., "Smooth high Tc Y1Ba2Cu30x films by laser deposition at 650 Degrees C.," Aug. 8, 1988, 517-519, App. Phys. Lett. 53 (6).
X. D. Wu et al., "Advances in the Laser Deposition of High Tc Oxide Superconducting Films at Bellcore/Rutgers," Aug. 24-26, 1988, Extended Abstracts of the 20th (1988 International) Conference on Solid State Devices and Materials, pp. 439-442.
A. Inam et al., "As-deposited high Tc and Jc superconducting thin films made at low temperatures," Sep. 5, 1988, 908-910, Appl. Phys. Lett. 53(10).
T. Venkatesan et al., "Advances in Processing High-Temperature Superconducting Thin Films with Lasers," Sep. 25-30, 1988, 234-264, Chapt. 19 of textbook derived from 1988 (Los Angeles)Symposium ACS Symposium Series 377-Chemistry of High-Temperature Superconductors II, D. L. Nelson et al. Editors.
T. Venkatesan et al., "Nature of the Pulsed Laser Process for the Deposition of High Tc Superconducting Thin Films," Oct. 10, 1988, 1431-1433, Appl. Phys. Lett. 53(15).
H. Sankur et al., "Formation of Dielectric and Semiconductor Thin Films by Laser-Assissted Evaporation," 271-284, Applied Physics A (Solids and Surfaces).
B. Dutta et al., "Pulsed Laser Deposition: A Viable Process for Superconducting Thin Films?," Feb. 1989, 106-109, Solid State Technology.
Venkatesan Thirumalai
Wu Xin D.
Bell Communications Research Inc.
Padgett Marianne L.
Phelan Charles S.
Rutgers University
Silverman Stanley
LandOfFree
Method and apparatus for pulsed energy induced vapor deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for pulsed energy induced vapor deposition , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for pulsed energy induced vapor deposition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1647295