Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,

Details Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3, Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,

1978-11-16

1980-11-04

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430920, 430270, 430281, 430283, 430285, 430288, 430194, 430177, 430179, 430495, 430338, 430343, 430339, 430345, 430171, 430195, 542458, 542459, G03C 168, G03C 152

Patent

active

042321069

ABSTRACT:
Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazole compounds represented by the following general formula (I): ##STR1## wherein W represents a substituted or unsubstituted aryl group, X represents a hydrogen atom, an alkyl group or an aryl group, Y represents a fluorine atom, a chlorine atom or a bromine atom, and n represents an integer of 1 to 3.

REFERENCES:
patent: 3708297 (1973-01-01), Poot et al.
patent: 3954475 (1976-05-01), Bonham et al.

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