Vibration-preventive apparatus and exposure apparatus

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Details

248550, 248638, 73662, G03B 2742, F16M 1300

Patent

active

058124209

ABSTRACT:
A position of movement of a stage is measured by an interferometer when the stage placed on a vibration-preventive pedestal of an exposure apparatus is moved. An output of the interferometer is multiplied by K so as to correct an amount of inclination of the vibration-preventive pedestal caused by movement of a position of a center of gravity during the movement of the stage, and an obtained value is feedforward-inputted into a vibration control system of a control unit. The vibration control system controls actuators on the basis of outputs of a displacement sensor and a vibration sensor and the feedforward-inputted value so that vibration of the vibration-preventive pedestal is suppressed. A vibration-compensating system multiplies, by g, displacements .theta..sub.x, .theta..sub.y in a direction of inclination with respect to a horizontal plane obtained on the basis of outputs of three vertical displacement sensors. Obtained results are subtracted from outputs of horizontal acceleration sensors. Thus gravitational acceleration components can be removed from the outputs of the horizontal sensors. The suppressing effect on disturbance vibration can be improved without being affected by the movement of the position of the center of gravity of the main apparatus body associated with the movement of the stage.

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