Exposure control system with follow focus capability

Details Exposure control system with follow focus capability Exposure control system with follow focus capability

1975-03-03

1976-07-27

Hix, L. T.

354 29, 354 47, 354 59, 354139, 354149, 354196, 354230, G03B 716

Patent

active

039720578

ABSTRACT:
An improved exposure control system featuring a follow-focus mechanism wherein the geometrical relationship of the mechanical components are determined in a select manner to provide uniform adjustment of the exposure aperture through a trim mechanism irrespective of the actual focus setting. The follow focus additionally may be precisely calibrated despite the cumulative effect attributable to the dimensional variations of the individual components albeit such variations remain within prescribed tolerances.

REFERENCES:
patent: 3478660 (1969-11-01), Land
patent: 3832722 (1974-08-01), Douglas

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