Reticle assembly having non-superposed position measurement patt

Details Reticle assembly having non-superposed position measurement patt Reticle assembly having non-superposed position measurement patt

1997-04-16

1998-09-22

Rutledge, D.

Photocopying

Projection printing and copying cameras

Step and repeat

G03B 2742

Patent

active

058122443

ABSTRACT:
In a reticle (or mask) assembly including a plurality of reticles (or masks) for manufacturing a semiconductor device, each of the reticles (or masks) having a plurality of I-shaped (or L-shaped) patterns for position measurement, the I-shaped (or L-shaped) patterns are not superposed on each other on the semiconductor device, and coordinate values determined by the I-shaped (or L-shaped) patterns of one of the reticles (or masks) on the semiconductor coincide with coordinate values determined by the I-shaped (or L-shaped) patterns of another of the reticles (or masks) on the semiconductor device.

REFERENCES:
patent: 5005046 (1991-04-01), Hashimoto
patent: 5499100 (1996-03-01), Tanaka
patent: 5585925 (1996-12-01), Sato et al.
Okada et al., "Improvement of Pattern Position Accuracy with the LMS2020", Digest of Papers, Photomask Japan '96, Symposium on Photomask and X-Ray Mask Technology III, Apr., 1996, pp. 96-97.

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