Film type light receiving element and sputter method of manufact

Coating processes – Electrical product produced – Photoelectric

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Details

427 87, 427 89, 4271262, 357 30, 428623, 428635, 428636, 428642, 430128, 4272553, H01L 2714

Patent

active

043703607

ABSTRACT:
A film type light receiving element and a method for producing such an element in which the electric current ratio for light and dark input intensities is large while the resistance of an optically transmissive electrode is made low. Belt-shaped metal electrodes and a photoconductive film are provided on a smooth surface of an insulating substrate. The optically transmissive electrode film layer is formed on the photoconductive film. A portion of the optically transmissive electrode film adjacent the photoconductive film has a high specific resistance while the remaining portion has a low specific resistance. To form the portion having a low specific resistance, the film is formed by sputtering in an oxygen partial pressure close to a value at which a minimum specific resistance is obtained while to form the portion having a high specific resistance, the oxygen partial pressure is set to a value higher than the value at which the minimum specific resistance is obtained.

REFERENCES:
patent: 4214253 (1980-07-01), Hall
patent: 4234625 (1980-11-01), Petrov et al.
patent: 4255686 (1981-03-01), Maruyama et al.

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