Pattern detecting apparatus utilizing energy beam

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

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356401, G01N 2186

Patent

active

047695510

ABSTRACT:
Pattern detection and measurement comprises: first irradiation means for irradiating a workpiece with a first energy beam; detection means for receiving a second energy beam emitted from a portion of the workpiece irradiated by the first energy beam, thereby detecting a pattern in the irradiated portion; second irradiation means for irradiating the workpiece with a third energy beam; discrimination means for receiving a fourth energy beam emitted from a portion of the workpiece irradiated by the third energy beam, thereby discriminating whether the portion irradiated by the third energy beam is sensitive to the first energy beam; and control means for controlling, in response to the output of the discrimination means, the first energy beam in irradiating the sensitive portion, thereby preventing the damage of the sensitive portion by the first energy beam.

REFERENCES:
patent: 4566795 (1986-01-01), Matsuura et al.
patent: 4577095 (1986-03-01), Watanabe
patent: 4701050 (1987-10-01), Oshida et al.
patent: 4702606 (1987-10-01), Matsuura et al.
patent: 4725737 (1988-02-01), Nakata et al.

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