Plasma treating apparatus

Details Plasma treating apparatus Plasma treating apparatus

1981-10-28

1984-03-20

Chatmon, Jr., Saxfield

Electric lamp and discharge devices: systems

Combined load device or load device temperature modifying...

Distributed parameter resonator-type magnetron

219121PL, 427 34, 31323101, 31511161, 31511141, H01J 746, H01J 1980

Patent

active

044383681

ABSTRACT:
A plasma treating apparatus includes: an air-core coil for generating a static magnetic field which is axially uniform and a high-frequency waveguide for generating a high-frequency electromagnetic field which is irregular in the axial direction of the air-core coil. A plasma generating glass tube is disposed in the high-frequency waveguide and adapted to be supplied with a gas and a plasma reaction bath held under a vacuum for receiving the plasma flow which is generated axially in the glass tube. A substrate platform is disposed in the reaction bath for supporting a substrate to be treated at a right angle with respect to the plasma flow. There is also included a magnetic field generating coil disposed outside of said reaction bath for shaping the plasma.

REFERENCES:
patent: 2817045 (1957-12-01), Goldstein et al.
patent: 2837693 (1958-06-01), Norton
patent: 3280364 (1966-10-01), Sugawara et al.
patent: 3313979 (1967-04-01), Landauer
patent: 3541372 (1970-11-01), Omura et al.
patent: 3872349 (1975-03-01), Spero et al.
patent: 3906892 (1975-09-01), Van Cakenberghe
patent: 3911318 (1975-10-01), Spero et al.

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