Method of making a magnetic film target for sputtering

Details Method of making a magnetic film target for sputtering Method of making a magnetic film target for sputtering

1981-10-21

1984-10-09

Kaplan, G. L.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192N, 427 38, C23C 1500

Patent

active

044760000

ABSTRACT:
A method of making a magnetic film target for use in sputtering characterized by forming a film of a magnetic material on a substrate by ion-plating a raw magnetic material thereon. The raw magnetic material is either identical with the magnetic film material or an ingredient or ingredients for constituting it. In the latter case, one or more metallic ingredients are simultaneously ion-plated in the same system to form a magnetic alloy or compound film on the substrate. To prepare a magnetic alloy target in which the composition changes in the thickness direction, the ion plating ratio of respective metallic ingredients is changed with time.

REFERENCES:
patent: 3350180 (1967-10-01), Croll
patent: 3856579 (1974-12-01), Allen
patent: 4002546 (1977-01-01), Shirahata et al.
patent: 4112137 (1978-09-01), Zega
patent: 4354909 (1982-10-01), Takagi et al.
E. L. Hollar et al., Composite Film Metallizing for Ceramics, J. Electrochem. Soc., vol. 117, No. 11 (Nov. 1970) pp. 1461-1462.
D. Hadfield, Permanent Magnets and Magnetism, Iliffe Books Ltd, London, 1962, p. 389.

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