Apparatus for vapor deposition of a film on a substrate

Details Apparatus for vapor deposition of a film on a substrate Apparatus for vapor deposition of a film on a substrate

1981-12-14

1984-05-08

Smith, John D.

Coating apparatus

Gas or vapor deposition

With treating means

118730, 219343, 219347, H01L 2120, C23C 1308

Patent

active

044468172

ABSTRACT:
Substrates on which vapor deposition is to take place are mounted on the outside of a generally bell-shaped susceptor which is itself mounted immediately outside a similarly shaped shield which is transparent to infra-red radiation. Infra-red lamps are mounted within the shield and the radiant heat from them passes through the shield and heats the substrates through the susceptor. An outer, opaque, shield defines an annular gas passage through which reactant gases pass over the heated substrate to cause vapor deposition thereon. Purging gas may be passed between the transparent shield and the susceptor. The lamps and the susceptor may be relatively rotated. The arrangement substantially eliminates the possibility of the reactant gas causing deposition on the transparent shield which would interfere with the passage of radiant heat to the susceptor and the substrate.

REFERENCES:
patent: 3608519 (1971-09-01), Bean
patent: 3627590 (1971-12-01), Mammel
patent: 3633537 (1972-01-01), Howe
patent: 4047496 (1977-09-01), McNeilly

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