Method of forming SOS devices by selective laser treatment and r

Metal working – Method of mechanical manufacture – Assembling or joining

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29576W, 29571, 148187, 357 91, H01L 21263, H01L 2126

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active

044372256

ABSTRACT:
Disclosed is a method of fabricating semi-conductor devices comprising the steps of: forming non-singlecrystalline semiconductor layer on a singlecrystalline insulation substrate, ion-implanting selectively material, which reacts with the semi-conductor layer to form insulating material, into the semiconductor layer; and applying an energy radiation or a heat treatment to the semiconductor layer, whereby the non-singlecrystalline semiconductor layer portion not implanted with said material is singlecrystallized with a seed of the singlecrystalline insulation substrate and at the same time the non-singlecrystalline semiconductor layer portion implanted with the material is rendered insulated.

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Chang, C-A, IBM-TDB, 20, (1977), 2459.
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Kamins et al., IEEE-Electron Device Letts., EDL-1, (1980), 214.
Tasch et al., Electronics Letts., 15, (14), 1979, 435.

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