Exposure apparatus using excimer laser source

Details Exposure apparatus using excimer laser source Exposure apparatus using excimer laser source

1988-09-19

1990-08-28

Reinhart, Mark L.

Recorders

Printing, dotting, or punching marker

Ink transfer support or moving means

250226, 2502011, G01D 1514, G01J 120

Patent

active

049529455

ABSTRACT:
An exposure apparatus comprises a projection optical system, to project the image of an object on a first plane onto a second plane, a laser means for outputting a light beam to the projection optical system for projection, a measuring device for detecting a fluctuation of the optical characteristic of the projection optical system attributable to deviation of the wavelength of the light beam output from the laser and a control device responsive to the measuring device to adjust the wavelength of the light beam.

REFERENCES:
patent: 4458994 (1984-07-01), Jain et al.
patent: 4629313 (1986-12-01), Tanimoto
patent: 4666273 (1987-05-01), Shimizu et al.
patent: 4703166 (1987-10-01), Brunning

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