Process for manufacturing a photomask

Details Process for manufacturing a photomask Process for manufacturing a photomask

1987-07-17

1989-10-24

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, 430323, G03F 100

Patent

active

048761648

ABSTRACT:
A photomask manufacturing process including a step of forming metal silicide film on a transparent silica glass substrate. A resist is applied onto the metal silicide film and then a patterning mask is provided by light or electron beam, followed by developing step. Exposed portions of the metal silicide film is etched away using a dry etching process.

REFERENCES:
patent: 3600243 (1971-08-01), LaRocque
patent: 3721584 (1973-03-01), Diem
patent: 4051297 (1977-09-01), Veigel
patent: 4113486 (1978-09-01), Sato
patent: 4284713 (1981-08-01), Sato et al.
patent: 4393127 (1983-07-01), Greschner et al.
patent: 4478678 (1984-10-01), Watanabe

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