Process for manufacturing vertical dynamic random access memorie

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 47, 437 48, 437 60, 437 62, 437238, 437919, H01L 2170

Patent

active

051067757

ABSTRACT:
A semiconductor memory comprises a switching device and a charge-storage device disposed at the upper and lower sides, respectively, of each of semiconductor islands. The islands are formed on a semiconductor substrate that is completely isolated from the semiconductor substrate by an insulator. The switching device and charge-storage device are substantially the same width. The memory cell structure is extremely small. The cell structure is highly resistant to alpha-particles and is formed self-aligned. During manufacture, the SiO.sub.2 island is oxidized adjacent its lower end to insulate the island from the substrate.

REFERENCES:
patent: 4536785 (1985-08-01), Gibbons
patent: 4630088 (1986-12-01), Ogura et al.
patent: 4638460 (1987-01-01), Matsumoto
patent: 4672410 (1987-06-01), Miura et al.
patent: 4686552 (1987-08-01), Teng et al.
patent: 4704705 (1987-11-01), Womack
patent: 4737829 (1988-04-01), Morimoto et al.
patent: 4833516 (1989-05-01), Hwang et al.
patent: 4845048 (1989-07-01), Tamaki et al.
patent: 4937641 (1990-06-01), Sunami et al.
patent: 4984038 (1991-01-01), Sunami et al.
High Density One Device Dynamic MOS Memory Cells, by Itech et al., IEE Proc., vol. 130, Pt. I, No. 3, pp. 127-135, Jun. 1983.
A 4-Bit Dram with Folded Bit-Line Adaptive Sidewall Isolated Capacitor (FASIC) Cell by Mashiko et al., J. Sol. St. Cir., vol. 22, No. 5, Oct. 1987.
Trends in Megabit Dram Circuit Design by K. Itoh, Central Research Lab, Hitachi, Ltd., pp. 21-27, 1988.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for manufacturing vertical dynamic random access memorie does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for manufacturing vertical dynamic random access memorie, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for manufacturing vertical dynamic random access memorie will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1585758

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.