System and method for vacuum deposition of thin films

Details System and method for vacuum deposition of thin films System and method for vacuum deposition of thin films

1989-02-17

1990-08-28

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118726, 118730, 427 38, 427 42, 427 47, 4272551, 4272552, 4272557, C23C 1650

Patent

active

049516043

ABSTRACT:
A vacuum evaporation plasma plating system is disclosed in which the plasma and the crucible containing the evaporant material are part of an electrical circuit which effects vacuum evaporation operation. The crucible includes a constant anode cap which is heated by the plasma and thus maintains a low resistance circuit path to the crucible and also provides a uniform source of evaporant.

REFERENCES:
patent: 3984581 (1976-10-01), Dobler et al.
patent: 4147573 (1979-04-01), Morimoto
patent: 4197814 (1980-04-01), Takagi et al.
patent: 4217855 (1980-08-01), Takagi
patent: 4361114 (1982-11-01), Gurev
patent: 4448802 (1984-05-01), Buhl et al.
patent: 4461689 (1984-07-01), Diepers
patent: 4526132 (1985-07-01), Ohta
patent: 4619748 (1986-10-01), Moll et al.
patent: 4676194 (1987-06-01), Satou
patent: 4683149 (1987-07-01), Suzuki et al.
patent: 4707238 (1987-11-01), Okubo
patent: 4777908 (1988-10-01), Temple et al.
patent: 4805555 (1989-02-01), Itoh
patent: 4828870 (1989-05-01), Ando et al.
Pulker et al., "Optical and Mechanical Properties of Ion Plated Oxide Films", pp. 299-306.
Berry et al., "Thin Film Technology", pp. 139-142.
Bunshah et al., "Deposition Technologies for Films and Coatings, Developments and Applications", pp. 102-104.

Affiliated with

Also associated with

Rating

System and method for vacuum deposition of thin films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for vacuum deposition of thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for vacuum deposition of thin films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1582299