Thermal sensitive deodorant wafer

Details Thermal sensitive deodorant wafer Thermal sensitive deodorant wafer

1981-04-20

1983-01-04

Lacey, David L.

Chemical apparatus and process disinfecting, deodorizing, preser

Physical type apparatus

Including gas generating means

422 5, 422306, 55279, 424 40, 424 76, A61L 912

Patent

active

043672035

ABSTRACT:
A thermal sensitive deodorant wafer is disclosed which is used to neutralize odors caused by subjecting certain materials to elevated temperatures. A pad (2) is impregnated with a heat releasable deodorant and is encapsulated in a thermal sensitive shell (4) to form a wafer-like element (6). The shell decomposes when subjected to the elevated temperatures whereupon the deodorant is released to neutralize the odors.

REFERENCES:
patent: 2590529 (1952-03-01), Gillies et al.
patent: 2603532 (1952-07-01), Wheeler et al.
patent: 3274758 (1966-09-01), Parman
patent: 3655129 (1972-04-01), Seiner
patent: 3754861 (1973-08-01), Sadahiro
patent: 4117110 (1978-09-01), Hautmann

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