Method for effecting solder interconnects

Metal fusion bonding – Process – Plural joints

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

228203, 228248, B23K 120, B23K 3100

Patent

active

048892750

ABSTRACT:
A method for effecting high density solder interconnects between a substrate and at least one metalized film having through holes therein is provided. Solder is first applied to metalized portions of the substrates and the solder is then subject to a reflow process to provide reflowed solder. Pressure is applied to the reflowed solder during a second reflow process to provide prestressed or shaped solder. The metalized film is then positioned with at least one metalized portion adjacent to the shaped solder. Heat, as from a laser, is directed through the through holes in the film to melt the solder and form solder interconnections between the substrate and the metalized film.

REFERENCES:
patent: 3589591 (1971-06-01), Schwenn
patent: 3713575 (1973-01-01), Cushman
patent: 3926360 (1975-12-01), Moister, Jr.
patent: 4319708 (1982-03-01), Lomerson
patent: 4412642 (1983-11-01), Fisher, Jr.
patent: 4562637 (1986-01-01), Kushima et al.
patent: 4661192 (1987-04-01), McShane
patent: 4752027 (1988-06-01), Gschwend
IBM Technical Disclosure Bulletin, "Simultaneous Laser-Assisted Solder Reflow on Double-Sided . . . Carriers", vol. 31, No. 6, pp. 7-9, Nov. 1988.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for effecting solder interconnects does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for effecting solder interconnects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for effecting solder interconnects will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1573706

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.