Chloroprene polyether (meth)acrylate copolymer and process for p

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...

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C08F23618

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active

049579916

ABSTRACT:
A chloroprene copolymer produced by radical copolymerization of 50 to 95% of chloroprene, 5 to 50% of at least one polyether (meth)acrylate of a specific formula, and 0 to 10% of any monomer copolymerizable with chloroprene, these percentages being by weight and based on the total quantity of monomers copolymerized, exhibits a remarkable combination of excellent oil resistance, weathering resistance, heat resistance, and coldness resistance. It was found that even when a polyether molecular chain has poor compatibility with chloroprene rubber, if this chain has an acryloyl or a methacryloyl group at one or both ends thereof, it can be copolymerized with chloroprene, and the resulting chloroprene copolymer processes and above mentioned combination of excellent properties.

REFERENCES:
patent: 3431227 (1969-03-01), Kastning
patent: 3714296 (1973-01-01), Kitagawa et al.
patent: 3849519 (1974-11-01), Kadowaki et al.
patent: 3876732 (1975-04-01), Kitagawa et al.
patent: 3933754 (1976-01-01), Kitagawa
patent: 4054731 (1977-10-01), Marubashi
patent: 4146592 (1979-03-01), Kitagawa et al.
patent: 4234704 (1980-11-01), Sakanaka

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