Positive type photosensitive resin composition

Details Positive type photosensitive resin composition Positive type photosensitive resin composition

1981-03-02

1983-05-17

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430165, 430326, 430331, 430905, 430907, 430910, G03C 154

Patent

active

043840370

ABSTRACT:
A photosensitive resin composition comprising a 1,2-quanonediazide compound and a copolymer consisting essentially of (A) a conjugated diolefinic compound, (B) a monoolefinically unsaturated compound and (C) an .alpha.,.beta.-ethylenically unsaturated carboxylic acid. Said composition can provide a positive type resist which is difficult to break and excellent in adhesion to a substrate.

REFERENCES:
patent: 3551154 (1970-12-01), DiBlas et al.
patent: 3900325 (1975-08-01), Christensen et al.
patent: 3902906 (1975-09-01), Iwama et al.
patent: 4164421 (1979-08-01), Shinozaki et al.
patent: 4177074 (1979-12-01), Proskow
patent: 4294905 (1981-10-01), Okishi et al.

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