Overcoated amorphous silicon imaging members

Details Overcoated amorphous silicon imaging members Overcoated amorphous silicon imaging members

1985-09-30

1987-05-19

Goodrow, John L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 66, 430 84, G03G 514

Patent

active

046668063

ABSTRACT:
Disclosed is an electrostatographic imaging member comprised of a supporting substrate, a blocking layer of hydrogenated amorphous silicon with dopants, a hydrogenated amorphous silicon photoconducting layer with dopants, and in contact therewith a top overcoating layer of nonstoichiometric silicon nitride with from between 67 to 95 atomic percent of silicon, and from between 33 to 5 atomic percent of nitrogen.

REFERENCES:
patent: 4394426 (1983-07-01), Shimizu et al.
patent: 4460669 (1984-07-01), Ogawa et al.
patent: 4465750 (1984-08-01), Ogawa et al.
patent: 4525442 (1985-06-01), Shirai et al.
patent: 4544617 (1985-10-01), Mort et al.

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