Method of chromeless phase shift mask fabrication suitable for a

Details Method of chromeless phase shift mask fabrication suitable for a Method of chromeless phase shift mask fabrication suitable for a

1994-05-11

1996-01-30

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430312, 430313, 430314, G03F 900

Patent

active

054879620

ABSTRACT:
A method for forming chromeless phase shifting photomasks is provided. The photomasks include a transparent substrate and raised phase shifters formed with a vertical edge and a tapered edge. During a lithographic process using the photomask, the vertical edges of the phase shifters form nulls on a photoresist covered wafer. The tapered edge prevents the formation of undesirable stringers on the wafer. The method of the invention includes the steps of: forming an opaque etch mask including a pattern of opaque features on a transparent substrate; forming a layer of resist over one sidewall of each opaque feature; and then etching the photoresist with one etching species and the substrate with another etching species to form chromeless phase shifters each having a vertical edge and a tapered edge.

REFERENCES:
patent: 5079113 (1992-01-01), Ohta et al.
patent: 5126220 (1992-06-01), Tokitomo et al.
patent: 5153083 (1992-10-01), Garofalo et al.
patent: 5194344 (1993-03-01), Cathey et al.
patent: 5194346 (1993-03-01), Rolfson et al.
patent: 5208125 (1993-05-01), Lowrey et al.
patent: 5217830 (1993-06-01), Lowrey
patent: 5225035 (1993-07-01), Rolfson
patent: 5240796 (1993-08-01), Lee et al.
patent: 5281500 (1994-01-01), Cathey et al.
patent: 5288568 (1994-02-01), Cathey, Jr.
patent: 5292623 (1994-03-01), Kemp et al.
Lin, Burn J., "Phase Shifting and Other Challenges in Optical Mask Technology", IBM-EF-15 (Sep. 26, 1990).

Affiliated with

Also associated with

Rating

Method of chromeless phase shift mask fabrication suitable for a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of chromeless phase shift mask fabrication suitable for a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of chromeless phase shift mask fabrication suitable for a will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-156144