Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1995-06-05
1997-07-22
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430311, 430313, 430258, 343708, 343873, 343909, G03F 900
Patent
active
056502494
ABSTRACT:
Radomes having complexly curved, frequency selective surfaces are made with a high degree of precision to assure part-to-part uniformity in electrical performance using a three-dimensional conformal mask and a precision etch process. The mask has a transparent substrate and a patterned opaque layer on the substrate. We expose photosensitive material overlying a thin film metal layer (generally deposited on a dielectric) through the mask. Metal exposed by patterning the photosensitive material is etched with a CuCl.sub.2 and chloride salt solution, and the remainder of the layer of photosensitive material is removed to complete the patterning.
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Dull Dennis L.
Jensen David G.
Tichenor Daniel R.
Hammar John C.
Rosasco S.
The Boeing Company
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