Patent
1984-04-03
1986-02-18
Edlow, Martin H.
357 231, 357 237, 357 2312, 357 4, 357 55, 357 59, H01L 2702
Patent
active
045716099
ABSTRACT:
An MOS type semiconductor device having a semiconductor substrate, an insulating layer formed in or on said semiconductor substrate, and an MOS transistor formed on said insulating layer, characterized in that said insulating layer is formed at a region below said MOS transistor excluding at least part of the region below a channel region of said MOS transistor.
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Edlow Martin H.
Jackson, Jr. Jerome
Tokyo Shibaura Denki Kabushiki Kaisha
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