Method of patterning styrene diene block copolymer electron beam

Details Method of patterning styrene diene block copolymer electron beam Method of patterning styrene diene block copolymer electron beam

1975-09-22

1977-12-06

Powell, William A.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

156643, 156659, 427273, B44C 122, C03C 1500, B05D 306

Patent

active

040617998

ABSTRACT:
Disclosed is a method of forming patterned electron beam resists from styrene-diene block copolymers and the resists formed thereby. A thin film of a styrene-diene block copolymer is applied to a support and is subjected to an electron beam scan. An electron beam irradiates a portion of the copolymer film according to a programmed pattern; the copolymer cross links where irradiated, thus causing the irradiated portion of the copolymer to become insoluble in a solvent. The balance of the copolymer remains soluble in the solvent, dissolves and is removed, resulting in the desired pattern of openings.

REFERENCES:
patent: 3674486 (1972-07-01), Milgrom
patent: 3794510 (1974-02-01), Scala et al.

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