Exposure equipment

Details Exposure equipment Exposure equipment

1997-03-18

1998-04-28

Mathews, A. A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 359569, 430 5, G03B 2742, G03B 2752

Patent

active

057452210

ABSTRACT:
An exposure equipment which is simply configured and can expose fine cyclic patterns whose pitch is smaller than the wavelength of light source has the laser beam 2 (wavelength .lambda.) outgoing from the light source 1 reflected on the mirror 3a, 3b, guided to the beam expander optical system 4, and converged by a focusing lens 4a, passing through a pinhole 4c located on the focal plane of the focusing lens 4a, and converted into parallel beam 5 with the beam diameter expanded by a collimator lens 4b, wherein this parallel beam 5 vertically impinges on and penetrates a phase shifter 6 with recessed portion and protruded portion repeatedly formed on the outgoing surface side of the parallel flat plate configured with transparent material of refraction index n, and as a result, .+-. first order diffracted light is generated, and the .+-. first order diffracted lights interfere with one another on the sensitized film facing the phase shifter via a spacer 7 to form fine fringes, thereby exposing the sensitized film.

REFERENCES:
patent: 5446587 (1995-08-01), Kang et al.
patent: 5587834 (1996-12-01), Noguchi
patent: 5608575 (1997-03-01), Suzuki
patent: 5638211 (1997-06-01), Shiraishi
patent: 5642183 (1997-06-01), Sugihara et al.

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