Photomask

Details Photomask Photomask

1992-09-08

1994-03-15

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430396, G03F 900

Patent

active

052945065

ABSTRACT:
In a photomask according to the present invention, an attenuating film is formed on one major surface of a transparent glass substrate. The attenuating film has an opening, in which a phase-shifting film is formed. A non-transparent film for shutting out incident light is formed a portion of the attenuating film while being contiguous with the phase-shifting film. Thus, the intensity of light through the attenuating film substantially coincides with the intensity of the phase-shifting film. As a result, the peak intensity passing through the photomask becomes constant.

REFERENCES:
patent: 4169655 (1979-10-01), Jacobsson
patent: 4971843 (1990-11-01), Michelotti et al.
patent: 5045417 (1991-09-01), Okamoto

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