Pattern forming method

Radiation imagery chemistry: process – composition – or product th – Use of sound or nondigital compressive force

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Details

430311, 430322, 430325, 430328, G03F 738

Patent

active

052945057

ABSTRACT:
Disclosed herein is a method of forming a thin film pattern on a semiconductor substrate, which comprises a step of forming a photosensitive thin film on a semiconductor substrate, a step of exposing the photosensitive thin film with a fine pattern, a step of performing ultrasonic treatment on the exposed thin film, and a step of developing the ultrasonic-treated thin film for forming a fine pattern.

REFERENCES:
patent: 4391281 (1983-07-01), Green
patent: 4447510 (1984-05-01), Frass
patent: 4521092 (1985-06-01), Ferrante
patent: 5143663 (1992-09-01), Leyden

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