Substrate spin cleaning apparatus

Details Substrate spin cleaning apparatus Substrate spin cleaning apparatus

1996-05-17

1998-07-28

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

134148, 134181, 134902, 239265, B08B 302

Patent

active

057850682

ABSTRACT:
A substrate spin cleaning apparatus includes a nozzle attached through a first and second support brackets to support shaft that is rotatable about a vertical axis. The nozzle delivers a cleaning liquid to the surface of a spinning substrate in a pin-point mode and under high pressure, while moving a liquid application point on the substrate surface between the substrate spin center and peripheral edge of the substrate. The first support bracket defines an arcuate slot extending within a plane including the spin center and a tip of the nozzle and along an imaginary circle about the spin center. The nozzle is attached to the second support bracket connected to the first support bracket which in turn is through the arcuate slot, to deliver the cleaning liquid to the spin center. The application point is movable through the spin center regardless of the inclination angle of the nozzle relative to the substrate surface. The nozzle inclination angle relative to the substrate surface is readily variable in accordance with the thickness or type of layer formed on the substrate surface, or the type of contaminant to be removed therefrom.

REFERENCES:
patent: 4564280 (1986-01-01), Fukuda
patent: 4728041 (1988-03-01), Draxler et al.
patent: 5032217 (1991-07-01), Tanaka
patent: 5259407 (1993-11-01), Tuchida et al.
patent: 5608943 (1997-03-01), Konishi et al.

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