Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1980-11-13
1982-08-10
Hoffman, James R.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
204164, 427 74, 427 75, H01L 3118, B05D 138, B05D 512
Patent
active
043438300
ABSTRACT:
Method and apparatus for minimizing the deleterious effects of structural imperfections in polycrystalline silicon solar cells uses a high pressure plasma system. The high pressure plasma system is used to introduce atomic hydrogen into the polycrystalline silicon substrates or into polycrystalline silicon solar cells. The silicon can be subjected to the hydrogenation either before or after it has a junction. The high pressure plasma system includes a high pressure chamber having a first and a second auxiliary chamber coupled to the high pressure chamber.
REFERENCES:
Semiconductor International, vol. 2, No. 4, p. 16 (May 1979), "New Technique Offers Potential of Doubling Efficiency of Polycrystalline Silicon Solar Cells".
Legge Ronald N.
Sarma Kalluri R.
Barbee Joe E.
Hoffman James R.
Motorola Inc.
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