Thermal reactor

Details Thermal reactor Thermal reactor

1980-02-29

1982-08-10

Bernstein, Hiram

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including heat exchanger for reaction chamber or reactants...

422202, 422224, 55204, C22B 2600

Patent

active

043437729

ABSTRACT:
A thermal reactor apparatus and method of pyrolyticaly decomposing silane gas into liquid silicon product and hydrogen by-product gas is disclosed. The thermal reactor (1) has a reaction chamber (21) which is heated well above the decomposition temperature of silane. An injecter probe (100) introduces the silane gas tangentially into the reaction chamber (21) to form a first, outer, forwardly moving vortex (22) containing the liquid silicon product and a second, inner, rearwardly moving vortex (23) containing the by-product hydrogen gas. The liquid silicon in the first outer vortex (22) deposits onto the interior walls (28) of the reaction chamber (21) to form an equilibrium skull layer (26) which flows to the forward or bottom end of the reaction chamber where it is removed. The by-product hydrogen gas in the second inner vortex (23) is removed from the top or rear of the reaction chamber by a vortex finder (30).
The injecter probe (100) which introduces the silane gas into the reaction chamber (21) is continually cooled by a cooling jacket (110) having water circulating therethrough to keep the temperature of the silane gas well below its decomposition temperature prior to being introduced into the reaction zone.

REFERENCES:
patent: 1402784 (1922-01-01), Moore
patent: 2697031 (1954-12-01), Hervert
patent: 2849930 (1958-09-01), Freeman et al.
patent: 3057690 (1962-10-01), Reaschel et al.
patent: 3099523 (1963-07-01), Reaschel
patent: 3694168 (1972-09-01), Hilgers et al.
patent: 3766661 (1973-10-01), Bayens et al.
patent: 4059415 (1977-11-01), Kosaka et al.
patent: 4123229 (1978-10-01), Carman
patent: 4162291 (1979-07-01), Arcella et al.

Affiliated with

Also associated with

Rating

Thermal reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thermal reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal reactor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1530909