Method of diagnosing malfunctions in semiconductor manufacturing

Details Method of diagnosing malfunctions in semiconductor manufacturing Method of diagnosing malfunctions in semiconductor manufacturing

1993-07-29

1997-06-24

Voeltz, Emanuel T.

Boots, shoes, and leggings

364149, 364150, 364578, 36446828, 438 14, G06F 1130

Patent

active

056422962

ABSTRACT:
Manufacturing modern day integrated circuits requires that each of a long sequence of steps perform to a tight set of specifications. Since equipment malfunctions are inevitable, profitable manufacturing of integrated circuits requires that such malfunctions be rapidly isolated and corrected. This invention describes the use of process models for diagnosing semiconductor manufacturing equipment malfunctions. One method makes use of multiple models and the second method makes use of a single model at multiple operating points. The fault isolation approaches described herein are based on the analysis of the discrepancy between model predictions and the observed outputs. The approaches have been evaluated on a process for plasma enhanced chemical-vapor deposition of silicon nitride, and the plasma enhanced etching of silicon nitride.

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May and Spanos, Automated Malfunction Diagnosis of Semiconductor Fabrication Equip. A Plasma Etch Application, IEEE, Feb. 1993, vol. 6, No. 1 pp. 28-40.

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