Method for forming deposited film

Details Method for forming deposited film Method for forming deposited film

1987-04-02

1989-02-21

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 55, 427402, B05D 306

Patent

active

048063860

ABSTRACT:
An apparatus for forming a deposited film comprises a chamber, which can be brought into a reduced pressure, for forming a deposited film on a substrate by introducing a starting gas into said chamber and decomposing or polymerizing said gas, the apparatus is provided with both a means for decomposing or polymerizing said gas by discharging and a means for decomposing or polymerizing said gas by heat.

REFERENCES:
patent: 4401689 (1983-08-01), Ban
patent: 4532196 (1985-07-01), Yasui et al.

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