Method for producing solderable metallized layer on a semiconduc

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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204192C, 427 91, 427 92, 427 93, 427 94, 427124, 427383A, 427383B, C23L 1302

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active

041328132

ABSTRACT:
The provision of a supplementary layer of nickel by an electroless process in order to provide solder wetting capability for a tempered aluminum-nickel metallization is made unnecessary by causing the layer of nickel deposited on an underlying aluminum metallization layer to have a thickness between 0.6 and 1.0 .mu.m and by conducting the subsequent tempering operation between 400 and 480.degree. C, preferably 475.degree. C, for a period of between 10 and 20 minutes, preferably 15 minutes. In order to provide high transverse conductivity, the aluminum layer should have a thickness between 3 and 10 .mu.m. The process is useful in the manufacture of semiconductor devices as well as for making electrical devices based on an insulating substrate.

REFERENCES:
patent: 3479736 (1969-11-01), Toki et al.
patent: 3579375 (1972-05-01), Wonilowicz
patent: 3633269 (1972-01-01), Bachmeier
patent: 3806361 (1974-04-01), Lehner
patent: 3922385 (1975-11-01), Konantz et al.
patent: 3965279 (1976-06-01), Levinstein

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