Methods for evaluating image-forming characteristics of a projec

Details Methods for evaluating image-forming characteristics of a projec Methods for evaluating image-forming characteristics of a projec

1997-10-29

1999-09-14

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 30, 430296, G03F 900

Patent

active

059521333

ABSTRACT:
Methods and devices are disclosed for evaluating image-forming characteristics of a projection system of a charged-particle-beam (CPB) microlithography apparatus. Signals providing information on such characteristics are obtained with a high S/N ratio and with high accuracy. Multiple markers are formed on an evaluation substrate mounted on a wafer stage. The projection system comparatively scans a projected image (using the CPB) of an evaluation pattern and a marker, while charged particles or secondary electrons reflected from the marker are detected. The evaluation substrate is preferably a thin film having a mean atomic number of 16 or less. Each marker is formed from a material having a mean atomic number of at least 47. A CPB-absorption body is situated beneath the evaluation substrate to absorb charged particles that penetrate the evaluation substrate.

REFERENCES:
patent: 5824441 (1998-10-01), Farrow et al.

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