Process for preparation of semiconductor device

Details Process for preparation of semiconductor device Process for preparation of semiconductor device

1987-07-24

1988-05-03

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427314, B05D 306

Patent

active

047419199

ABSTRACT:
A process for the preparation of a semiconductor device by the plasma chemical vapor deposition of amorphous silicon on a substrate, which comprises generating plasma in a deposition furnace by using a high frequency wave of less than 1 MHz to deposit an amorphous silicon film, and generating oxygen plasma in the same deposition furnace and irradiating the amorphous silicon film with the oxygen plasma.

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