Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-06-21
1996-10-01
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430167, 430197, 4302701, 4302801, 4302831, 430942, 430966, G03F 7012, G03F 7027
Patent
active
055610269
ABSTRACT:
A photosensitive material comprising a photosensitive-group-containing fullerene such as a photosensitive material which is obtained by adding a photosensitive group to fullerene and/or a photosensitive material which is obtained by combining the fullerene with a photosensitive agent is provided. The photosensitive material according to the present invention has excellent properties as a new resist which is a photosensitive material suitable as a photolithographic resist for the production of semiconductors utilizing such light source as ultraviolet light, deep ultraviolet light, X-ray or electron beam and which meets the requirements for realization of a higher level of resolution and sensitivity.
REFERENCES:
patent: 5178980 (1993-01-01), Mort et al.
patent: 5215841 (1993-06-01), Scharfe et al.
patent: 5250378 (1993-10-01), Wang
Chu John S. Y.
Nippon Oil Co. Ltd.
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