Manufacturing method for hologram which can prevent the formatio

Details Manufacturing method for hologram which can prevent the formatio Manufacturing method for hologram which can prevent the formatio

1995-02-16

1997-07-15

Henry, Jon W.

Optical: systems and elements

Holographic system or element

Copying by holographic means

359 30, 359493, 359494, 359601, 359614, G03H 120, G02B 530

Patent

active

056488572

ABSTRACT:
A manufacturing method for a hologram which can control the formation of a ghost hologram due to a surface reflected light caused on an interface with the atmosphere is disclosed. In the first manufacturing method for a hologram by a two-beam method or a one-beam method, on an interface between a substrate having a hologram photosensitive layer and the atmosphere is disposed a quarter-wave plate, and an incident light is converted from a circularly polarized light to a P-polarized light (or an S-polarized light) through the quarter-wave plate. On the other hand, in the second manufacturing method for a hologram, a substrate, which has a hologram photosensitive layer, is fittingly held by prisms on both sides thereof. A reference light is a P-polarized light, and an angle of the reference light to a surface reflected light on an interface of the reference light is set to be approximate to a right angle. It is appropriate that a reproduced hologram is manufactured by the one-beam method by using a hologram manufactured by the above method as a master hologram.

REFERENCES:
patent: 3796476 (1974-03-01), Frosch et al.
patent: 4691994 (1987-09-01), Afian et al.
patent: 5103232 (1992-04-01), Magarinos et al.
patent: 5330264 (1994-07-01), Ando et al.

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