Photoresist composition comprising an alkali-soluble resin, a qu

Details Photoresist composition comprising an alkali-soluble resin, a qu Photoresist composition comprising an alkali-soluble resin, a qu

1995-08-03

1997-07-15

Chu, John S. Y.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, 4302812, 4302881, G03F 7023, G03F 7028

Patent

active

056481942

ABSTRACT:
A photoresist composition comprising an alkali soluble resin, an o-naphthoquinone diazide sulfonic acid ester photoactive compound, and a vinyl ether compound. The o-naphthoquinone diazide sulfonic acid ester is replaced in part with the vinyl ether composition to decrease the concentration of the photoactive compound while increasing the photospeed of the composition.

REFERENCES:
patent: 5364738 (1994-11-01), Kondo et al.
patent: 5403695 (1995-04-01), Hayase et al.
patent: 5527656 (1996-06-01), Imai et al.

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