Photosensitive O-quinone diazide containing composition

Details Photosensitive O-quinone diazide containing composition Photosensitive O-quinone diazide containing composition

1978-12-05

1981-05-19

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430166, 430313, 430314, 430318, 430327, 430329, 430330, 430331, 20415923, G03C 154, G03C 160, G03C 170

Patent

active

042686024

ABSTRACT:
The present invention relates to a novel photosensitive composition. In particular, the present invention relates to a photosensitive resin composition suitable for use as a photoresist.

REFERENCES:
patent: 3126281 (1964-03-01), Sus et al.
patent: 3269837 (1966-08-01), Sus
patent: 3402044 (1968-09-01), Steinhoff
patent: 3502470 (1970-03-01), Delzenne et al.
patent: 3533796 (1970-10-01), Lassig et al.
patent: 3597202 (1971-08-01), Cerwinka
patent: 3660097 (1972-05-01), Mainthia
patent: 3725356 (1973-04-01), Ludeus et al.
patent: 3759711 (1973-09-01), Rauner et al.
patent: 3933885 (1976-01-01), Satomura
patent: 4093461 (1978-06-01), Loprest et al.
patent: 4104070 (1978-08-01), Moritz et al.
Dinaburg, M. S., "Photosensitive Diazo Cpds", The Focal Press, 1964, pp. 191-196.

Affiliated with

Also associated with

Rating

Photosensitive O-quinone diazide containing composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive O-quinone diazide containing composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive O-quinone diazide containing composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1490497