Patent
1987-09-08
1991-02-05
Carroll, J.
357 65, 357 71, H01L 2348, H01L 2946, H01L 2962, H01L 2964
Patent
active
049909959
ABSTRACT:
A low reflectance conductor for an integrated circuit is disclosed. A layer of refractory metal is disposed over the aluminum alloy or silicide conductors commonly in use in integrated circuits. The layer of refractory metal is then treated in a plasma reactor to form a low reflective layer of refractory metal oxide on the surface.
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O'Toole et al., "Linewidth Control in Projection Lithography Using a Multilayer Resist Process", IEEE Transactions on Electron Devices, vol. ED-28, No. 11, Nov., 1981, pp. 1405-1410.
Carroll J.
Davis Jr. James C.
General Electric Company
Webb II Paul R.
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