Low reflectance conductor in an integrated circuit

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357 65, 357 71, H01L 2348, H01L 2946, H01L 2962, H01L 2964

Patent

active

049909959

ABSTRACT:
A low reflectance conductor for an integrated circuit is disclosed. A layer of refractory metal is disposed over the aluminum alloy or silicide conductors commonly in use in integrated circuits. The layer of refractory metal is then treated in a plasma reactor to form a low reflective layer of refractory metal oxide on the surface.

REFERENCES:
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patent: 4329706 (1982-05-01), Crowder et al.
patent: 4417387 (1983-11-01), Heslop
patent: 4531144 (1985-07-01), Holmberg
patent: 4556897 (1985-12-01), Yorikane et al.
patent: 4714951 (1987-12-01), Baudrant et al.
O'Toole et al., "Linewidth Control in Projection Lithography Using a Multilayer Resist Process", IEEE Transactions on Electron Devices, vol. ED-28, No. 11, Nov., 1981, pp. 1405-1410.

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