Thin film magnetic head and process for producing same

Details Thin film magnetic head and process for producing same Thin film magnetic head and process for producing same

1997-10-17

2000-07-04

Powell, William

Etching a substrate: processes

Forming or treating article containing magnetically...

216 41, 360113, B44C 122

Patent

active

060834102

ABSTRACT:
A plan or vertical type thin film magnetic head is produced by a process comprising the steps of: forming a gap separator layer of a non-magnetic material on the surface of a substrate, while the forming process is not limited to plating; forming a mask layer on the gap layer; patterning the mask layer to form a shield; etching the gap layer, while the shield functions as a mask, thereby forming a gap wall having a width narrower than that of the shield independent of the resolution degree of the resist; forming a magnetic pole layer of a soft magnetic material on the surface of the substrate by exposing the resist at a time, thereby the formed magnetic pole layer being separated by the gap wall; and, utilizing the gap wall as a magnetic pole gap of the magnetic pole layer.

REFERENCES:
patent: 5013394 (1991-05-01), Rolland et al.
patent: 5250150 (1993-10-01), Gaud et al.
patent: 5804085 (1998-09-01), Wu et al.

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