Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1997-12-16
2000-07-04
Warden, Sr., Robert J.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204403, 205783, 156292, G01N 27404
Patent
active
06083367&
ABSTRACT:
An oxygen electrode having: an electrode substrate; a first electrode and a first lead wire formed on the electrode substrate; an insulating layer formed on the electrode substrate covering the first lead wire; a second electrode and a second lead wire formed on the electrode substrate, and on the insulating layer; a container substrate bonded to the electrode substrate, and having a first recess with an opening over the first and second electrodes for containing electrolyte; and an oxygen permeable film covering the opening. The oxygen electrode may be provided with lead plates and partially molded in an insulating and fixing resin. An oxygen electrode for measuring an oxygen concentration having a novel structure is provided which can be made more compact and/or be used more easily.
REFERENCES:
patent: 4224280 (1980-09-01), Takahama et al.
patent: 4311151 (1982-01-01), Hagihara et al.
patent: 4453397 (1984-06-01), Ohta et al.
patent: 4697165 (1987-09-01), Tshiguro et al.
patent: 4772376 (1988-09-01), Yukawa et al.
patent: 4861456 (1989-08-01), Mase et al.
patent: 4883947 (1989-11-01), Murase et al.
patent: 4967589 (1990-11-01), Yagawara et al.
patent: 5250170 (1993-10-01), Yagawara et al.
patent: 5358619 (1994-10-01), Suzuki et al.
patent: 5476001 (1995-12-01), Hoetzel et al.
patent: 5538620 (1996-07-01), Nikolskaja
patent: 5608154 (1997-03-01), Kato et al.
Fujitsu Limited
McNeil Jennifer
Warden, Sr. Robert J.
LandOfFree
Oxygen electrode and its manufacture does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Oxygen electrode and its manufacture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Oxygen electrode and its manufacture will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1482629