Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1978-11-03
1980-06-24
Dean, R.
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
29578, 29580, 148 15, 148174, 148175, 148187, 156643, 156653, 156657, 156662, 204192E, 357 20, 357 48, 357 49, 357 50, 357 54, 357 56, 357 59, H01L 21302, H01L 21225, H01L 2176
Patent
active
042093503
ABSTRACT:
A method for forming diffusions having narrow, for example, submicrometer dimensions in a silicon body which involves forming insulator regions on a silicon body, which insulator regions have substantially horizontal surfaces and substantially vertical surfaces. A layer having a desired dopant concentration is formed thereon, both on the substantially horizontal surfaces and the substantially vertical surfaces. Reactive ion etching of the layer acts to substantially remove only the horizontal layer and provides a narrow dimensioned layer having a desired dopant concentration in the substantially vertical surfaces. Heating of the body at a suitable temperature is accomplished so as to produce the movement of the dopant into the silicon body by diffusion to form diffusions having narrow, such as submicrometer dimensions, therein.
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Ho Irving T.
Riseman Jacob
Dean R.
International Business Machines - Corporation
Saba W. G.
Saile George O.
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