Treatment apparatus

Details Treatment apparatus Treatment apparatus

1998-09-16

2000-07-04

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

Automatic controls

134 952, 1341022, 1341023, 134902, B08B 304

Patent

active

06082381&

ABSTRACT:
A cleaning tank 30 stores a cleaning liquid to clean the surfaces of semiconductor wafers W immersed in the cleaning liquid. A cleaning liquid supply pipe 33 connects the cleaning tank 30 to a pure water supply source 31. A chemical liquid container 34 stores a chemical liquid, and a chemical liquid supply pipe 36 connects the cleaning liquid supply pipe 33 to the chemical liquid container 34 via an infusion open/close switching valve 35, and a chemical liquid feed means is interposed in the chemical liquid supply pipe 36. The chemical liquid feed means is a reciprocal pump, such as diaphragm pump 37. Thus, a predetermined quantity of the chemical liquid can be infused into pure water or to a drying gas generator to ensure that the chemical liquid of a predetermined concentration be available for washing or drying treatment, regardless of fluctuations in flow amount or pressure of pure water or a drying gas carrier gas.

REFERENCES:
patent: 2355882 (1944-08-01), Malsbary et al.
patent: 3276694 (1966-10-01), Alexander
patent: 4892112 (1990-01-01), Knetsch
patent: 5336356 (1994-08-01), Ban et al.
patent: 5520744 (1996-05-01), Fujikawa et al.
patent: 5699817 (1997-12-01), Bankert et al.
patent: 5803983 (1998-09-01), Simandl et al.

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